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AWWA ACE65116

AWWA ACE65116 Comparing UV-H2O2 and UV-HOCl/OCl- Oxidation Processes for Aqueous Nitrobenzene Photodegradation

Conference Proceeding by American Water Works Association, 06/01/2007

Watts, Michael J.; Rosenfeldt, Erik J.; Linden, Karl G.

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This powerpoint presentation explains how chlorine photodegrades in LPUV-irradiated waters faster than Hsub2/subO2, regardless of pH;OH is a photo-product of both chlorine and Hsub2/subOsub2/sub; in acidic chlorine solutions, more OH is available for oxidation of organic contaminants;OH-oxidation of NB was fastest in LPUV-irradiated chlorinated solutions at pH 5;less 4-, 3-, and 2-nitrophenol were formed in pH 5 chlorinated solutions exposed to LPUV;multiple unknowns detected by HPLC-photodiode array (pH 5 free chlorine); UV-Clsub2/sub in solutions adjusted to pH 5 was the least energy-intensive UV-AOP;to oxidize 4.5 M of NB in post-sand-filtration water would require large UV fluences (1200 mJ cmsup-2/sup) regardless of added oxidant; oxidant costs were small for both UV-HOCl/OClsup-/sup and UV-Hsub2/subOsub2/sub relative to lamp energy costs; and, increasing the initial Hsub2/subOsub2/sub dose (2.1 to 5.1 mg/L) led to the most significant reduction in required UV fluence (9360 to 4065 mJ cmsup-2/sup). Includes 4 references, figures.

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